Curvilinear data processing methods and verification-Reference-Cited by-同舟云学术

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Curvilinear data processing methods and verification

Published:2018-09-19 Issue: Volume: Page:
ISSN:
Container-title:34th European Mask and Lithography Conference
language:
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Author:

Browning Clyde H.,Postnikov Serguei,Milléquant Matthieu,Bayle Sebastien,Schiavone Patrick

Publisher

SPIE

Reference6 articles.

1. OPC for Curved Designs in Application to Photonics on Silicon;Orlando,2016

2. Data preparation in the age of curvilinear patterns;Bayle,2016

3. Why we should escape a 1D-centric e-beam lithography flow;Schiavone,2016

4. Photonic curvilinear data processing;Browning,2014

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Inverse Lithography with Structured Sub-Resolution Assist Features;2024 2nd International Symposium of Electronics Design Automation (ISEDA);2024-05-10

2. Mask synthesis for silicon photonics devices;Integrated Photonics Platforms II;2022-05-26

3. MRC for curvilinear mask shapes;Photomask Technology 2020;2020-10-15

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