Development of next-generation nanolithography methods to break the optical diffraction limit-Reference-Cited by-同舟云学术

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Development of next-generation nanolithography methods to break the optical diffraction limit

Published:2016-10-31 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Luo Huiwen¹,Wang Liang¹,Qin Jin¹,Ding Li¹

Affiliation:

1. Univ. of Science and Technology of China (China)

Publisher

SPIE

Reference24 articles.

1. Matching the Resolution of Electron Beam Lithography by Scanning Near-Field Photolithography;Sun,2004

2. Pixel-based simultaneous source and mask optimization for resolution enhancement in optical lithography;Ma.,2009

3. Large-area surface-plasmon polariton interference lithography;Guo,2006

4. Formation of Bandgap and Subbands in Graphene Nanomeshes with Sub-10 nm Ribbon Width Fabricated via Nanoimprint Lithography;Liang,2010

5. Nanoimprint Lithography: Methods and Material Requirements;Guo,2007

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mechanism of near-field optical nanopatterning on noble metal nano-films by a nanosecond laser irradiating a cantilevered scanning near-field optical microscopy probe;Applied Optics;2023-05-03

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