Platinum-based alloy absorber with improved etching properties for next-generation EUV mask-Reference-Cited by-同舟云学术

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Platinum-based alloy absorber with improved etching properties for next-generation EUV mask

Published:2023-11-21 Issue: Volume: Page:
ISSN:
Container-title:International Conference on Extreme Ultraviolet Lithography 2023
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Author:

Kim Yunsoo,Jeong Dongmin,Lee Seungho,Ahn Jinho

Publisher

SPIE

Reference5 articles.

1. Recent advances in EUV patterning in preparation towards high-NA EUV;Nagahara;Advances in Patterning Materials and Processes XL,2023

2. Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?;Erdmann,2019

3. Nanofabrication;Cui,2008

4. Effect of temperature on etch rate of iridium and platinum in CF4/O2

5. Computer modeling of LED light pipe systems for uniform display illumination;Van Derlofske,2001

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank;Journal of Micro/Nanopatterning, Materials, and Metrology;2024-07-12

2. EUV reflectometry and scatterometry for thin layer and periodic structure characterization;Metrology, Inspection, and Process Control XXXVIII;2024-04-10

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