Fabrication error analysis for diffractive optical elements used in a lithography illumination system-Reference-Cited by-同舟云学术

Fabrication error analysis for diffractive optical elements used in a lithography illumination system

Published:2015-04-13 Issue:4 Volume:54 Page:045102
ISSN:0091-3286
Container-title:Optical Engineering
language:en
Short-container-title:Opt. Eng

Author:

Wang Jian¹,Zhang Fang¹,Song Qiang¹,Zeng Aijun²,Zhu Jing²,Huang Huijie²

Affiliation:

1. Shanghai Institute of Optics and Fine Mechanics, Lab of Information Optics and Optoelectronic Technology, Chinese Academy of Sciences, No. 390 Qinghe Road, Jiading District, Shanghai 201800, ChinabUniversity of the Chinese Academy of Sciences, No. 19 Yuqu

2. Shanghai Institute of Optics and Fine Mechanics, Lab of Information Optics and Optoelectronic Technology, Chinese Academy of Sciences, No. 390 Qinghe Road, Jiading District, Shanghai 201800, China

Publisher

SPIE-Intl Soc Optical Eng

Subject

General Engineering,Atomic and Molecular Physics, and Optics

Reference17 articles.

1. Fan-out diffractive optical elements designed for increased fabrication tolerances to linear relief depth errors

2. Theory of speckles in diffractive optics and its application to beam shaping

3. Diffractive elements for high-power fibre coupling applications

4. Recent developments in computer-generated holography: toward a practical electroholography system for interactive 3D visualization

5. Design and fabrication of a highly off-axis binary multi-phase-level computer-generated hologram based on an effective medium approach

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