Author:
Harada Tetsuo,Hashimoto Hiraku,Amano Tsuyoshi,Kinoshita Hiroo,Watanabe Takeo
Reference21 articles.
1. Study on Critical Dimension of Printable Phase Defects Using an Extreme Ultraviolet Microscope: II. Definition of Printable Threshold Region for Hole-Pit Programmed Defects
2. Printability of Native Blank Defects and Programmed Defects and Their Stack Structures;Kwon,2011
3. Quantitative evaluation of mask phase defects from through-focus EUV aerial images;Mochi,2011
4. Improvement of total quality on EUV mask blanks toward volume production;Shoki,2010
5. Current status of EUV mask blanks and LTEM substrates defectivity and cleaning of blanks exposed in EUV ADT;Kadaksham,2011