Fast measurement of wavefront aberration in double-grating Ronchi lateral shearing interferometry
Author:
Affiliation:
1. Chinese Academy of Sciences, Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Shanghai, China
Publisher
SPIE-Intl Soc Optical Eng
Subject
General Engineering,Atomic and Molecular Physics, and Optics
Reference39 articles.
1. The impact of aberration averaging during step-and-scan on the photolithographic process
2. Impact of wavefront errors on low k1 processes at extremely high NA
3. Forty Years of History of a Grating Interferometer
4. Double Frequency Grating Lateral Shear Interferometer
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1. Two-frame wavefront reconstruction method with nonlinear optimization for Ronchi lateral shearing interferometry;Optics Communications;2024-05
2. Lateral shearing interferometry method based on double-checkerboard grating by suppressing aliasing effect;Optics Express;2024-03-28
3. Distortion measurement of a lithography projection lens based on multichannel grating lateral shearing interferometry;Applied Optics;2024-03-06
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