Study on overlay AEI-ADI shift on contact layer of advanced technology node
Author:
Affiliation:
1. Semiconductor Manufacturing International Corp. (China)
Publisher
SPIE
Reference5 articles.
1. Reduction of image-based ADI-to-AEI overlay inconsistency with improved algorithm
2. Simulation of Non-Uniform Wafer Geometry and Thin Film Residual Stress on Overlay Errors;Veeraraghaven,2011
3. Relationship between localized wafer shape changes induced by residual stress and overlay errors;Turner,2011
4. Predicting distortions and overlay errors due to wafer deformation during chucking on lithography scanners;Turner,2010
5. Overlay similarity: a new overlay index for metrology tool and scanner overlay fingerprint methodology
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