The effect of materials selection on metals reduction in propylene glycol methyl ether acetate, PGMEA

Author:

Entezarian Majid1,Geiger Bob1

Affiliation:

1. 3M Purification (United States)

Publisher

SPIE

Reference5 articles.

1. Phenolic Resins: A Century of Progress

2. Rainer Leuschner, Georg Pawlowski, Photolithography, Wiley-VCH Verlag GmbH & Co. KgaA, (2013).

3. M. Rahman, U.S. patent 5962183 A, Metal ion reduction in photoresist compositions by chelating ion exchange resin, (1999).

4. Trace metal removal from microlithography process chemicals: Part I. photoresist solvents

5. Maik W. Jornitz and Theodore H. Meltzer, Filtration and Purification in the Biopharmaceutical Industry, Second Edition, CRC Press, (2007).

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Metal Ions Removal from Organic Solvents using MXene-Based Membranes;ACS Applied Engineering Materials;2023-10-11

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