1. ITRS Roadmap, http://www.itrs.net/Links/2006Update/2006UpdateFinal.htm.
2. Implementation of hybrid metrology at HVM fab for 20nm and beyond;Vaid,2013
3. Spectroscopic ellipsometry for lithography front-end level CD control: a complete analysis for production integration;Herisson,2003
4. Scatterometry for shallow trench isolation (STI) process metrology;Raymond,2001
5. Comparison of Measured Optical Image Profiles of Silicon Lines with Two Different Theoretical Models;Silver,2002