Kinetics of laser induced changes of characteristic optical properties in Lithosil with 193nm excimer laser exposure-Reference-Cited by-同舟云学术

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Kinetics of laser induced changes of characteristic optical properties in Lithosil with 193nm excimer laser exposure

Published:2005-05-12 Issue: Volume: Page:
ISSN:
Container-title:Optical Microlithography XVIII
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Author:

Natura Ute,Martin Rolf,von der Goenna Gordon,Kahlke Michael,Fasold Gabriele

Publisher

SPIE

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Impact of heat treatment on NBOHC luminescence of OH-containing and H2-impregnated fused silica for deep-ultraviolet applications;Journal of Luminescence;2019-05

2. Deep-UV materials;Advanced Optical Technologies;2018-08-28

3. Correlation between 193nm absorption and photoluminescence-related defects for fused silica materials;Optical Materials Express;2018-03-06

4. Repetition rate dependence of absorption of fused silica irradiated at 193 nm;Chinese Optics Letters;2013

5. Comparative study of fused silica materials for ArF laser applications;SPIE Proceedings;2011-10-05

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