Automatic inspection of a residual resist layer by means of self-organizing map-Reference-Cited by-同舟云学术

Automatic inspection of a residual resist layer by means of self-organizing map

Published:2016-05-26 Issue:5 Volume:55 Page:054106
ISSN:0091-3286
Container-title:Optical Engineering
language:en
Short-container-title:Opt. Eng

Author:

Philippe Zaki Sabit Fawzi¹,Robert Stéphane²,Bayard Bernard²

Affiliation:

1. Laboratoire Hubert Curien—Centre National de la Recherche Scientifique Unité Mixte de Recherche 5516, Batiment F, 18 Rue Professeur Benoît Lauras, Saint Etienne 42000, FrancebLaboratoire des Technologies de l'Information et de la Communication—Institut Un

2. Laboratoire Hubert Curien—Centre National de la Recherche Scientifique Unité Mixte de Recherche 5516, Batiment F, 18 Rue Professeur Benoît Lauras, Saint Etienne 42000, France

Publisher

SPIE-Intl Soc Optical Eng

Subject

General Engineering,Atomic and Molecular Physics, and Optics

Reference28 articles.

1. Fabrication of inverse micro/nano pyramid structures using soft UV-NIL and wet chemical methods for residual layer removal and Si-etching

2. Ion beam etching;Harper,1989

3. Surface processes in plasma-assisted etching environments

4. Dimensional characterization of biperiodic imprinted structures using optical scatterometry

5. Multiparameter grating metrology using optical scatterometry

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