Improved environmental stability for plasma enhanced chemical vapor deposition SiO2waveguides using buried channel designs-Reference-Cited by-同舟云学术

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Improved environmental stability for plasma enhanced chemical vapor deposition SiO2waveguides using buried channel designs

Published:2016-04-25 Issue:4 Volume:55 Page:040501
ISSN:0091-3286
Container-title:Optical Engineering
language:en
Short-container-title:Opt. Eng

Author:

Wall Thomas A.¹,Chu Roger P.¹,Parks Joshua W.²,Ozcelik Damla²,Schmidt Holger²,Hawkins Aaron R.¹

Affiliation:

1. Brigham Young University, Electrical and Computer Engineering, 459 Clyde Building, Provo, Utah 84602, United States

2. University of California, Santa Cruz, Baskin Engineering, Room 40, 1156 High Street, Santa Cruz, California 95064, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

General Engineering,Atomic and Molecular Physics, and Optics

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of storage and surface roughness on the SiO2 thin films adhesion behavior;Journal of Adhesion Science and Technology;2021-05-04

2. Surface improvement investigation of sol–gel SiO2 cladding for waveguide device passivation;Japanese Journal of Applied Physics;2019-07-25

3. Multi-layer stacking scheme of sol-gel based SiO₂ towards thicker (>0.8 µm) cladding layers for optical waveguides;IEICE Electronics Express;2018

4. Optofluidic Lab-on-a-Chip Fluorescence Sensor Using Integrated Buried ARROW (bARROW) Waveguides;Micromachines;2017-08-17

5. Mitigating Water Absorption in Waveguides Made From Unannealed PECVD SiO2;IEEE Photonics Technology Letters;2017-05-15

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