ArF solutions for low-k 1 back-end imaging-Reference-Cited by-同舟云学术

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ArF solutions for low-k 1 back-end imaging

Published:2003-06-25 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Wiaux Vincent,Montgomery Patrick K.,Vandenberghe Geert,Monnoyer Philippe,Ronse Kurt G.,Conley Will,Litt Lloyd C.,Lucas Kevin,Finders Jo,Socha Robert,Van Den Broeke Douglas J.

Publisher

SPIE

Cited by 17 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. UV laser-assisted multiple evanescent waves lithography for near-field nanopatterning;Micro & Nano Letters;2009-12-01

2. Hyper-NA imaging of 45nm node random CH layouts using inverse lithography;Optical Microlithography XXI;2008-03-14

3. Manufacturing implementation of IMLTMtechnology for 45nm node contact masks;SPIE Proceedings;2006-05-04

4. Through pitch contact hole imaging for the 65nm node;Microelectronic Engineering;2006-04

5. Versatility in lithographic performance of advanced 193 nm contact hole resist;SPIE Proceedings;2006-03-10

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