1. E-beam based EUV mask characterization for studying mask induced wafer effects;Vidya,2018
2. Tough road ahead for device overlay and edge placement error;Kaustuve,2019
3. EUV lithography and its enablement of future generations of semiconductor devices;Nak;EUV Workshop,2020
4. Evaluation of local CD and placement distribution on EUV mask and its impact on wafer;Vidya;Photomask Japan,2019
5. Mask Contribution to OPC Model Accuracy;Adam,2020