1. Crimmins, T., G. Zhang and S. Carson , “Toward high-yield EUV lithography; patterned reticle and wafer defect metrology challenges and opportunities,” (Intel Corporation, Photolithography Workshop, Kauai, Hawaii 2010).
2. High-performance next-generation EUV lithography light source
3. Sematech EUV Source Workshop, May 29 to 30, 2009 Baltimore, Md. Workshop Proceedings, Https://Www.Sematech.Org/8656a/Proceedings.Htm (2009).
4. Choi, P. et al., “Next generation lithography light sources,” International EUVl Symposium, Lake Tahoe, USA, October (2008).
5. Goldstein, M., S. Wurm and F. Goodwin , “High power from low etendue EUV light sources,” International EUVl Symposium, Lake Tahoe, USA, October (2008).