Performance overview and outlook of EUV lithography systems-Reference-Cited by-同舟云学术

Performance overview and outlook of EUV lithography systems

Published:2015-03-13 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Pirati Alberto,Peeters Rudy,Smith Daniel,Lok Sjoerd,Minnaert Arthur,van Noordenburg Martijn,Mallmann Jörg,Harned Noreen,Stoeldraijer Judon,Wagner Christian,Zoldesi Carmen,van Setten Eelco,Finders Jo,de Peuter Koen,de Ruijter Chris,Popadic Milos,Huang Roger,Lin Martin,Chuang Frank,van Es Roderik,Beckers Marcel,Brandt David,Farrar Nigel,Schafgans Alex,Brown Daniel,Boom Herman,Meiling Hans,Kool Ron

Publisher

SPIE

Reference8 articles.

1. EUV Lithography: NXE platform performance review;Peeters,2014

2. Status of EUV Lithography;Yen,2015

3. EUV lithography industrialization progress;Peeters,2014

4. Progress and challenges towards EUV HVM;Lim,2015

5. Performance optimization of MOPA prepulse LPP light source;Schafgans,2015

Cited by 45 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Quad-Pass Homodyne Interferometer With Picometer Periodic Nonlinearity and No Beam Walk-Off;IEEE Sensors Journal;2023-07-15

2. Volatile vapor knife of immersion lithography hood using solutal Marangoni effect;Journal of Vacuum Science & Technology B;2022-09

3. Key technology development progress of the high power LPP-EUV light source;Optical and EUV Nanolithography XXXV;2022-05-26

4. Contribution of mask defectivity in stochastics of EUVL-based wafer printing;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-05-08

5. Programming Metasurface Near‐Fields for Nano‐Optical Sensing;Advanced Optical Materials;2021-05-08