1. Efficient model-based dummy-fill OPC correction flow for deep submicron technology nodes;Hamouda,2014
2. Study of model based etch bias retarget for OPC;Liu,2010
3. Etch aware optical proximity correction: a first step toward integrated pattern engineering;Dunn,2009
4. Dry etch proximity modeling in mask fabrication;Granik,2003
5. Etch correction and OPC, a look at the current state and future of etch correction;Stobert,2013