Author:
Foucher J.,Pargon E.,Martin M.,Farys V.,Bécu S.,Babaud L.
Cited by
2 articles.
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1. Study of the Electron Beam Effect on Critical Sizes of Photoresistive Mask Elements in SEM Measurements;2024 IEEE 25th International Conference of Young Professionals in Electron Devices and Materials (EDM);2024-06-28
2. Scanning Probe Microscopy for Critical Measurements in the Semiconductor Industry;Scanning Probe Microscopy in Industrial Applications;2013-11-08