Application of Principal Component Analysis to EUV multilayer defect printing-Reference-Cited by-同舟云学术

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Application of Principal Component Analysis to EUV multilayer defect printing

Published:2015-09-23 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Optical Systems Design 2015: Computational Optics
language:
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Author:

Xu Dongbo,Evanschitzky Peter,Erdmann Andreas

Publisher

SPIE

Reference26 articles.

1. Simulation of Multilayer Defects in Extreme Ultraviolet Masks

2. Fast near field simulation of optical and EUV masks using the waveguide method;Evanschitzky,2007

3. AIMS EUV-the actinic aerial image review platform for EUV masks;Hellweg,2011

4. Actinic inspection of multilayer defects on EUV masks;Barty,2005

5. Improving the performance of the Actinic Inspection Tool with an optimized alignment procedure;Mochi,2009

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Orthogonal mode decomposition of aspheric surface form errors by principal components analysis;Optical Engineering;2018-12-15

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