Development of novel thick spin-on carbon hardmask-Reference-Cited by-同舟云学术

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Development of novel thick spin-on carbon hardmask

Published:2019-03-25 Issue: Volume: Page:
ISSN:
Container-title:Advances in Patterning Materials and Processes XXXVI
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Author:

Yoon Byeri,Shin Seungwook,Kim Youngmin,Heo Yumi,Park Soyeon,Choi Sungho,Han Miyeon,Lim Sanghak

Publisher

SPIE

Reference7 articles.

1. Spin-on Organic Hardmask Materials in 70nm Devices;Oh,2007

2. Silicon-Based Anti-Reflective Spin-On Hardmask Materials with Improved Storage Stability for 193 nm Lithography;Kyun Kim,2007

3. Silicon-Based Anti-Reflective Spin-On Hardmask Materials for 45 nm pattern of immersion ArF Lithography;Kim,2008

4. Novel Spin-on Organic Hardmask with High Plasma Etch Resistance;Oh,2008

5. Study on thick film spin-on carbon hardmask;Kim,2017

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