Impact of a plasma mitigation process on the 266 nm pulsed LiDT of RAR nano-textured fused silica-Reference-Cited by-同舟云学术

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Impact of a plasma mitigation process on the 266 nm pulsed LiDT of RAR nano-textured fused silica

Published:2022-12-02 Issue: Volume: Page:
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Container-title:Laser-Induced Damage in Optical Materials 2022
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Author:

Zaaf Amile N.,Small Hayden S.,LeRocque Tadd M.,Robson Andrew R.,Manni Anthony D.,Hobbs Douglas S.

Publisher

SPIE

Reference22 articles.

1. Deep-UV lithography using continuous-wave 266-nm radiation from an all solid state frequency quadrupled Nd: YAG laser;Suganuma,1995

2. 266-nm ps Laser Ablation for Copper-Plated p-Type Selective Emitter PERC Silicon Solar Cells

3. Application of 266-nm and 355-nm Nd:YAG laser radiation for the investigation of fuel-rich sooting hydrocarbon flames by Raman scattering

4. Measurements of the Weak UV Absorptions of Isoprene and Acetone at 261–275 nm Using Cavity Ringdown Spectroscopy for Evaluation of a Potential Portable Ringdown Breath Analyzer

5. Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm

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