1. Study of EUV mask inspection technique using DUV light source for hp 22 nm and beyond;Hirano,2010
2. Performance of EBeyeM for EUV Mask Inspection;Yamaguchi,2011
3. Demonstration of defect free EUV mask for 22 nm NAND flash contact Layer using electron beam inspection system;Shimomura,2011
4. Development of EB inspection system EBeyeM for EUV mask;Hirano,2010
5. Study of EUV mask inspection using projection EB optics with programmed pattern defect;Hirano,2012