Visualization of resist flow fields in microlithography by using defocusing digital particle image velocimetry
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Published:2013-07-11
Issue:3
Volume:12
Page:033004
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ISSN:1932-5150
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Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
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language:en
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Short-container-title:J. Micro/Nanolith. MEMS MOEMS
Author:
Jun Du,Zhengying Wei,Shize Li,Yiping Tang
Publisher
SPIE-Intl Soc Optical Eng
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials