Advanced mask aligner lithography (AMALITH)-Reference-Cited by-同舟云学术

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Advanced mask aligner lithography (AMALITH)

Published:2012-02-21 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Voelkel Reinhard,Vogler Uwe,Bramati Arianna,Weichelt Tina,Stuerzebecher Lorenz,Zeitner Uwe D.,Motzek Kristian,Erdmann Andreas,Hornung Michael,Zoberbier Ralph

Publisher

SPIE

Cited by 17 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Contact photolithography modeling for thick photoresists layers;INTERNATIONAL CONFERENCE ON INFORMATICS, TECHNOLOGY, AND ENGINEERING 2021 (InCITE 2021): Leveraging Smart Engineering;2022

2. Lau Effect Using LED Array for Lithography;Nanomanufacturing and Metrology;2021-06-04

3. Computational rule-based approach for corner correction of non-Manhattan geometries in mask aligner photolithography;Optics Express;2019-10-24

4. Mask-aligner lithography using a continuous-wave diode laser frequency-quadrupled to 193 nm;Optics Express;2018-01-09

5. Three-dimensional photolithography using built-in lens mask;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2017-11

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