High throughput CD-SEM metrology using image denoising based on deep learning-Reference-Cited by-同舟云学术

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High throughput CD-SEM metrology using image denoising based on deep learning

Published:2024-04-10 Issue: Volume:12293 Page:65
ISSN:
Container-title:Metrology, Inspection, and Process Control XXXVIII
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Author:

Okuda Tomoyuki,Yamauchi Toshinori,Kang San,Park Yoongyu,Lee Kiwoong,Lee Ilyong,Park Hyewon,Lim Gwangseob,Jun Youjoung,Jun Yoonyoung,Shin Gyeongyun

Publisher

SPIE

Reference7 articles.

1. Depth of Focus in high-NA EUV Lithography: a simulation study;Burov,2022

2. Statistical simulation of resist at EUV and ArF;Biafore,2009

3. High-NA EUV lithography: the next major step forward;Simone,2021

4. High-voltage CD-SEM-based application to monitor 3D profile of high-aspect-ratio features;Sun;J. Micro/Nanolith. MEMSMOEMS,2020

5. Comparison between supervised and self-supervised deep learning for SEM image denoising;Okuda,2023

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