Interference lithography based on a phase mask for the fabrication of diffraction gratings-Reference-Cited by-同舟云学术

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Interference lithography based on a phase mask for the fabrication of diffraction gratings

Published:2023-12-18 Issue: Volume: Page:
ISSN:
Container-title:AOPC 2023: Optical Design and Manufacturing
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Author:

Huan Shuhu,Sun Manman,Li Shiyang,Liu Ying,Hong Yilin

Publisher

SPIE

Reference8 articles.

1. From subwavelength grating to metagrating: principle,design and applications;Rui;Infrared and Laser Engineering,2020

2. Design of sub-wavelength ultra-narrow band filter;Shuangyue;Infrared and Laser Engineering,2020

3. Dynamic Multi-Interference Lithography Incorporating Modulated Optical Fourier Transform System;Yan;Acta Optica Sinica,2023

4. E-beam lithography and optical near-field lithography: new prospects in fabrication of various grating structures;Kley,2003

5. Near-field holography with a twodimensional phase mask for fabrication of two-dimensional structures in a single exposure step;Hartung,2005

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