Maskless lithography and nanopatterning with electron and ion multibeam projection
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SPIE
Cited by 19 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Multi-beam mask writing opens up new fields of application;38th European Mask and Lithography Conference (EMLC 2023);2023-10-05
2. Cathodes for Electron Microscopy and Lithography;Modern Developments in Vacuum Electron Sources;2020
3. Cost-effective and channel-scalable hardware decoders for multiple electron-beam direct-write systems;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-08-22
4. Laser Sweeping Lithography: Parallel Bottom-up Growth Sintering of a Nanoseed–Organometallic Hybrid Suspension for Ecofriendly Mass Production of Electronics;ACS Sustainable Chemistry & Engineering;2018-02-22
5. Notes and References;Principles of Electron Optics;2018
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