Author:
Wachulak Przemyslaw W.,Sandberg Richard L.,Isoyan Artak,Urbanski Lukasz,Bartnik Andrzej,Bartels Randy A.,Menoni Carmen S.,Fiedorowicz Henryk,Rocca Jorge J.,Marconi Mario C.
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Talbot effect immersion lithography by self-imaging of very fine grating patterns;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2012-11
2. High-Order Approximation of the Talbot Distance for Lithography;Applied Physics Express;2012-09-06