Characterization of reactive plasma ion assisted HfO2 films for low loss optical coatings in the DUV and MWIR-Reference-Cited by-同舟云学术

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Characterization of reactive plasma ion assisted HfO2 films for low loss optical coatings in the DUV and MWIR

Published:2017-05-11 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Advanced Optics for Defense Applications: UV through LWIR II
language:
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Author:

Wang Jue¹,Cangemi Michael J.¹,Chinhong Christopher J.¹,D'lallo Michael J.¹,Platten Jim E.¹,Oudard Jean Francois¹,Wamboldt Leonard¹

Affiliation:

1. Corning Inc. (United States)

Publisher

SPIE

Reference17 articles.

1. Optical properties of HfO2 thin films deposited by magnetron sputtering: From the visible to the far-infrared

2. HfO2/SiO2 multilayer enhanced aluminum alloy-based dual-wavelength high reflective optics

3. Effect of Advanced Plasma Source bias voltage on properties of HfO2 films prepared by plasma ion assisted electron evaporation from metal hafnium

4. HfO2/SiO2 multilayer based reflective and transmissive optics from the IR to the UV;Wang;SPIE,2016

5. BDS thin film damage competition;Stolz;SPIE,2008

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Plasma-ion-assisted deposition of HfO2 films with low UV absorption;Surface and Coatings Technology;2020-08

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