Reflective electron beam lithography: lithography results using CMOS controlled digital pattern generator chip-Reference-Cited by-同舟云学术

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Reflective electron beam lithography: lithography results using CMOS controlled digital pattern generator chip

Published:2013-03-26 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Alternative Lithographic Technologies V
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Author:

Gubiotti Thomas,Sun Jeff Fuge,Freed Regina,Kidwingira Francoise,Yang Jason,Bevis Chris,Carroll Allen,Brodie Alan,Tong William M.,Lin Shy-Jay,Wang Wen-Chuan,Haspeslagh Luc,Vereecke Bart

Publisher

SPIE

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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3. Cost-effective and channel-scalable hardware decoders for multiple electron-beam direct-write systems;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-08-22

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