1. Make lithography great again;Progler,2016
2. Transform designs to chips, an end user point of view on mask making;Chen,2012
3. K. Standiford, private communication, and Future Fab Int., v.45 46 (2013)
4. Reduction of image placement error on photomask-making for multiple patterning,;Hiromatsu,2014
5. Modeling of charging effect and its correction by EB mask writer EBM-6000;Nakayamada,2008