Revisit pattern collapse for 14nm node and beyond-Reference-Cited by-同舟云学术

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Revisit pattern collapse for 14nm node and beyond

Published:2011-03-17 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Yoshimoto Kenji,Higgins Craig,Raghunathan Ananthan,Hartley John G.,Goldfarb Dario L.,Kato Hirokazu,Petrillo Karen,Colburn Matthew E.,Schefske Jeffrey,Wood Obert,Wallow Thomas I.

Publisher

SPIE

Cited by 20 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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4. Atomic layer deposition and its derivatives for extreme ultraviolet (EUV) photoresist applications;Japanese Journal of Applied Physics;2023-06-01

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