EUV lithography program at IMEC-Reference-Cited by-同舟云学术

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EUV lithography program at IMEC

Published:2007-03-16 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Goethals Anne Marie,Jonckheere Rik,Lorusso Gian Francesco,Hermans Jan,Van Roey Frieda,Myers Alan,Chandhok Manish,Kim Insung,Niroomand Ardavan,Iwamoto Fumio,Stepanenko Nikolay,Gronheid Roel,Baudemprez Bart,Ronse Kurt

Publisher

SPIE

Cited by 19 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Stochastic resist patterning simulation using attenuated PSM for EUV lithography;Extreme Ultraviolet (EUV) Lithography IV;2013-04-01

2. Improved imaging properties of thin attenuated phase shift masks for extreme ultraviolet lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-03

3. Shadowing 3D mask effects in EUV;SPIE Proceedings;2012-06-30

4. Optimized Multigrid Strategy for Accurate Flare Modeling with Three-Dimensional Mask Effect in Extreme-Ultraviolet Lithography;Japanese Journal of Applied Physics;2012-06-20

5. Optimized Multigrid Strategy for Accurate Flare Modeling with Three-Dimensional Mask Effect in Extreme-Ultraviolet Lithography;Japanese Journal of Applied Physics;2012-06-01

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