Single crystal silicon: surface evolution regularity of chemical etching and effect of nano jet polishing on damage precursor-Reference-Cited by-同舟云学术

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Single crystal silicon: surface evolution regularity of chemical etching and effect of nano jet polishing on damage precursor

Published:2019-05-10 Issue: Volume: Page:
ISSN:
Container-title:Second Symposium on Novel Technology of X-Ray Imaging
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Author:

Zhang Wanli,Shi Feng,Dai Yifan,Song Ci,Tian Ye,Zhong Yaoyu

Publisher

SPIE

Reference20 articles.

1. High fluence laser damage precursors and their mitigation in fused silica

2. Silica laser damage mechanisms, precursors and their mitigation;Bude,2014

3. A study on (100), (110) silicon wet aniso tropicetching;Zhiwei,2008

4. Nanometer accurate shaping with fluid jet polishing

5. Nanometer deep shaping with fluid jet polishing;Silvia;Society of Photo-Optical Instrumentation Engineers,2002

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Analysis of multiscale material removal mechanism in nanoparticle jet polishing;International Journal of Mechanical Sciences;2023-02

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