Retrieve polarization aberration from image degradation: a new measurement method in DUV lithography-Reference-Cited by-同舟云学术

Retrieve polarization aberration from image degradation: a new measurement method in DUV lithography

Published:2017-10-24 Issue: Volume: Page:
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Container-title:AOPC 2017: Optoelectronics and Micro/Nano-Optics
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Author:

Xiang Zhongbo,Li Yanqiu

Publisher

SPIE

Reference13 articles.

1. In-situ Mueller matrix polarimetry of projection lenses for 193-nm lithography;Nomura,2010

2. L. Dong, Y. Li, X. Dai et al., “Measuring the polarization aberration of hyper-NA lens from the vector aerial image.” International Symposium on Advanced Optical Manufacturing and Testing Technologies, 928313.

3. L. Shen, S. Li, X. Wang et al., “Analytical analysis for impact of polarization aberration of projection lens on lithographic imaging quality.” SPIE Advanced Lithography. 569–569.

4. Techniques for measuring aberrations in lenses used in photolithography with printed patterns

5. Interactions of 3D mask effects and NA in EUV lithography;Gräupner,2012

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1. Polarization aberration in-situ measurement in lithography tools;10th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced and Extreme Micro-Nano Manufacturing Technologies;2021-12-13

2. Hybrid calibration method of a wide-view-angle Mueller polarimeter for hyper-numerical-aperture imaging systems;Chinese Optics Letters;2020

3. Polarization Aberration Measurement Method Based on Principal Component Analysis of Differential Aerial Images;Acta Optica Sinica;2019