Epoxidized novolac resist (EPR) for high-resolution negative- and positive-tone electron beam lithography-Reference-Cited by-同舟云学术

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Epoxidized novolac resist (EPR) for high-resolution negative- and positive-tone electron beam lithography

Published:2000-03-17 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Advances in Resist Technology and Processing XVII
language:
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Author:

Tegou Evangelia,Gogolides Evangelos,Argitis Panagiotis,Raptis Ioannis,Patsis George P.,Glezos Nikos,Tan Zoilo C. H.,Lee Kim Y.,Le Phuong T.,Hsu Yautzong,Hatzakis Michael

Publisher

SPIE

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Optimized surface silylation of chemically amplified epoxidized photoresists for micromachining applications;Journal of Applied Polymer Science;2010-04-13

2. High performance resist for EUV lithography;Microelectronic Engineering;2005-01

3. A comparison of thermally and photochemically cross-linked polymers for nanoimprinting;Microelectronic Engineering;2003-06

4. Surface and line-edge roughness in plasma-developed resists;Microelectronic Engineering;2001-09

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