Patterning strategy and performance of 1.3NA tool for 32nm node lithography-Reference-Cited by-同舟云学术

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Patterning strategy and performance of 1.3NA tool for 32nm node lithography

Published:2008-03-14 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Optical Microlithography XXI
language:
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Author:

Mimotogi Shoji,Satake Masaki,Kitamura Yosuke,Takahata Kazuhiro,Kodera Katsuyoshi,Fujise Hiroharu,Ema Tatsuhiko,Sho Koutaro,Ishigo Kazutaka,Kono Takuya,Asano Masafumi,Yoshida Kenji,Kanai Hideki,Kyoh Suigen,Harakawa Hideaki,Nomachi Akiko,Ishida Tatsuya,Miyashita Katsura,Inoue Soichi

Publisher

SPIE

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Resist process control for 32-nm logic node and beyond with NA > 1.30 immersion exposure tool;Advances in Resist Materials and Processing Technology XXVI;2009-03-13

2. Feasibility studies of coating method for planarization process;Advances in Resist Materials and Processing Technology XXVI;2009-03-13

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