Author:
Browning Clyde,Quaglio Thomas,Figueiro Thiago,Pauliac Sébastien,Belledent Jérôme,Fay Aurélien,Bustos Jessy,Marusic Jean-Christophe,Schiavone Patrick
Reference8 articles.
1. Electron beam lithography writing strategies for low loss, high confinement silicon optical waveguides;Bojko,2011
2. Photonic integration improves on current technologies
3. Manhattan or Non-Manhattan?–A Study of Alternative VLSI Routing Architectures;Koh,1997
4. Shot count reduction for non-Manhattan geometries: concurrent optimization of data fracture and mask writer design;Cinque,2013
5. A novel mask proximity correction software combining accuracy and reduced writing time for the manufactur-ing of advanced photomasks;Schiavone,2012
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