1. Distinguishing dose from defocus for in-line lithography control;Ausschnitt,1999
2. Best focus determination: bridging the gap between optical and physical topography;Kahlenberg,2007
3. Projection Printing Characterization;Bossung,1977
4. Lithography process control using scatterometry metrology and semi-physical modeling;Lensinge,2007
5. Focus and dose characterization of immersion photoclusters;Brunner,2009