1. Innovative scatterometry approach for Self-Aligned Quadruple Patterning (SAQP) process control;Gunay-Demirkol,2016
2. Improving OCD time to solution using Signal Response Metrology
3. Signal response metrology (SRM): a new approach for lithography metrology;Pandev,2015
4. Scatterometry based metrology for SAQP pitch walking using virtual reference;Kagalwala,2016