Model-based virtual VSB mask writer verification for efficient mask error checking and optimization prior to MDP

Author:

Pack Robert C.,Standiford Keith,Lukanc Todd,Ning Guo Xiang,Verma Piyush,Batarseh Fadi,Chua Gek Soon,Fujimura Akira,Pang Linyong

Publisher

SPIE

Reference10 articles.

1. The requirements for the future e-beam mask writer; statistical analysis of pattern accuracy;Lee,2011

2. Mask Hotspots are Escaping the Mask Shop: Model-based Mask Verification Can Stop Them;Fujimura,2014

3. Flows for model-based layout correction of mask proximity effects

4. The impact of 14-nm photomask uncertainties on computational lithography solutions;Sturtevant,2013

5. Energy deposition functions in electron resist films on substrates

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