Nanoimprint lithography for augmented reality waveguide manufacturing-Reference-Cited by-同舟云学术

Nanoimprint lithography for augmented reality waveguide manufacturing

Published:2020-02-19 Issue: Volume: Page:
ISSN:
Container-title:Optical Architectures for Displays and Sensing in Augmented, Virtual, and Mixed Reality (AR, VR, MR)
language:
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Author:

Thanner Christine,Dudus Anna,Treiblmayr Dominik,Berger Georg,Chouiki Mustapha,Martens Stephan,Jurisch Michael,Harbaum Julian,Eibelhuber Martin

Publisher

SPIE

Reference4 articles.

1. Wafer level optics Fabrication and Integration;Kast,2010

2. Nanoimprint Lithography enables cost effective photonics production;Eibelhuber,2015

3. A full-process chain assessment for nanoimprint technology on 200-mm industrial platform;Teyssedre*;Advanced Optical Technologies,2017

4. Rules-based correction strategies setup on sub-micrometer line and space patterns for 200 mm wafer scale SmartNILTM process within an integration process flow;Teyssedre,2011

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