Dry etching resistance of resist base polymer and its improvement
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SPIE
Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Ion implantation as insoluble treatment for resist-stacking process;Journal of Micro/Nanolithography, MEMS, and MOEMS;2010-01-01
2. Ion implantation as insoluble treatment for resist stacking process;Advances in Resist Materials and Processing Technology XXV;2008-03-14
3. Post Plasma Etch Residue Removal Using CO[sub 2]-Based Mixtures: Mechanistic Considerations;Journal of The Electrochemical Society;2005
4. New trilayer resist process using a phenol-capped siloxane-based middle-layer for ArF resist process;Advances in Resist Technology and Processing XX;2003-06-11
5. Optimization of Polysilane Structure as Fast-Etching Bottom Antireflective Coating for Deep Ultraviolet Lithography;Japanese Journal of Applied Physics;2002-11-15
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