High resolution nanoimprint templates for dual damascene: fabrication and imprint results-Reference-Cited by-同舟云学术

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High resolution nanoimprint templates for dual damascene: fabrication and imprint results

Published:2008-03-14 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Irmscher Mathias,Butschke Joerg,Carpio Ron,Chao Brook,Jen Wei-Lun,Koepernik Corinna,Nedelmann Lorenz,Owens Jordan,Palmieri Frank,Pritschow Marcus,Reuter Christian,Sailer Holger,Satoodeh Ken,Wetzel Jeff,Wilks Bruce,Willson Grant

Publisher

SPIE

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electrical evaluation of copper damascene interconnects based on nanoimprint lithography compared with ArF immersion lithography for back-end-of-line process;Japanese Journal of Applied Physics;2024-02-20

2. The current status of nano-imprint lithography and its future outlook toward carbon neutrality by 2050;Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology;2022-09-16

3. Multi-field imprint technology: enabling the productivity enhancement of nano-imprint lithography;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-12-16

4. Advances in Nanoimprint Lithography;Annual Review of Chemical and Biomolecular Engineering;2016-06-07

5. Nanomanufacturing: A Perspective;ACS Nano;2016-02-22

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