In-line lithography cluster monitoring and control using integrated scatterometry-Reference-Cited by-同舟云学术

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In-line lithography cluster monitoring and control using integrated scatterometry

Published:2004-04-29 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Pollentier Ivan,Cheng Shaunee Y.,Baudemprez Bart,Laidler David,van Dommelen Youri,Carpaij Rene,Yu Jackie,Uchida Junichi,Viswanathan Anita,Chin Doris,Barry Kelly,Jakatdar Nickhil

Publisher

SPIE

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Development of a Monitoring Strategy for Laser-Textured Metallic Surfaces Using a Diffractive Approach;Materials;2019-12-20

2. Scatterometry—fast and robust measurements of nano-textured surfaces;Surface Topography: Metrology and Properties;2016-04-05

3. Dose Map and Placement Co-Optimization for Improved Timing Yield and Leakage Power;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2010-07

4. Scatterometry solutions and vision for advanced lithography process control;SPIE Proceedings;2007-03-16

5. Evaluation of producer’s and consumer’s risks in scatterometry and scanning electron microscopy metrology for inline critical dimension metrology;Journal of Micro/Nanolithography, MEMS, and MOEMS;2006-10-01

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