Author:
Schmoeller Thomas,Tyminski Jacek K.,Lewellen John,Demmerle Wolfgang
Cited by
3 articles.
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1. Pattern inspection of etched multilayer extreme ultraviolet mask;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-01-29
2. Pattern inspection of etched multilayer EUV mask;Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII;2015-07-09
3. Effective exposure dose monitoring technique in extreme ultraviolet lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2011-01-01