High coverage of litho hotspot detection by weak pattern scoring

Author:

Park Jinho,Kim NamJae,Kang Jae-hyun,Paek Seung Weon,Kwon Steve,Shafee Marwah,Madkour Kareem,ElManhawy Wael,Kwan Joe,Brunet Jean-Marie

Publisher

SPIE

Reference7 articles.

1. W. C. Tam and R. D. Blanton., “To DFM or Not To DFM?” Design Automation Conference (2011).

2. Resolution Enhancement Techniques in Optical Lithography

3. Resolution enhancement technology: The past, the present and extension for the feature;Schellenberg,2004

4. A state-of-the-art hotspot recognition system for full chip verification with lithographic simulation

5. Systematic Data Mining Using a Pattern Database to Accelerate Yield Ramp;Teoh,2014

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1. Robust qualification flows for DRC decks using high coverage synthetic layout generation;DTCO and Computational Patterning;2022-05-26

2. A Novel ML Augmented DRC Framework for Identification of Yield Detractor Patterns;IEEE Transactions on Semiconductor Manufacturing;2021-08

3. Applying machine learning methods to accelerate advanced process node yield ramp;Design-Process-Technology Co-optimization XV;2021-02-22

4. Machine learning to improve accuracy of fast lithographic hotspot detection;Design-Process-Technology Co-optimization for Manufacturability XIII;2019-03-20

5. A random generation approach to pattern library creation for full chip lithographic simulation;SPIE Proceedings;2017-04-04

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