Megasonic cleaning strategy for sub-10nm photomasks-Reference-Cited by-同舟云学术

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Megasonic cleaning strategy for sub-10nm photomasks

Published:2016-10-04 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Hsu Jyh-Wei¹,Samayoa Martin²,Dress Peter³,Dietze Uwe²,Ma Ai-Jay⁴,Lin Chia-Shih⁴,Lai Rick⁴,Chang Peter⁴,Tuo Laurent⁴

Affiliation:

1. SUSS MicroTec Inc. (Taiwan)

2. SUSS MicroTec Inc. (United States)

3. SUSS MicroTec Photomask Equipment (Germany)

4. Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)

Publisher

SPIE

Reference20 articles.

1. Fundamental study of MegaSonic cleaning;Zhang,1993

2. Cavitation;Young,1989

3. Cleaning technology challenges for sub 16nm hp node;Rastegar,2011

4. Measurement of hydroxyl radicals in wafer cleaning solutions irradiated with megasonic waves;Keswani,2014

5. Efficient ozone, sulfate and ammonium free resist stripping process;Dattilo,2014

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