1. Use of Spin-on-Hard Mask Materials for nano scale patterning technology;Wu,2008
2. Development of Spin-on Carbon Hardmasks with Comparable Etch Resistance to Amorphous Carbon Layer (ACL);Cheon,2008
3. Novel Spin-on Organic Hardmask with High Plasma Etch Resistance;Oh,2008
4. Performance of tri-layer process required for 22nm and beyond;Wei,2011