Fast source optimization by clustering algorithm based on lithography properties-Reference-Cited by-同舟云学术

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Fast source optimization by clustering algorithm based on lithography properties

Published:2015-03-18 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Tawada Masashi,Hashimoto Takaki,Sakanushi Keishi,Nojima Shigeki,Kotani Toshiya,Yanagisawa Masao,Togawa Nozomu

Publisher

SPIE

Reference10 articles.

1. Mutual source, mask and projector pupil optimization;Fuhner,2012

2. An Innovative Source-Mask co-Optimization (SMO) method for extending low k1 imaging;Hsu,2008

3. Source-mask co-optimization: optimize design for imaging and impact of source complexity on lithography performance;Hsu,2009

4. Novel fine-tuned model-based SRAF generation method using coherence map;Kodera,2010

5. Optimizing style options for sub-resolution assist features;Liebmann,2001

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1. 计算光刻研究及进展;Laser & Optoelectronics Progress;2022

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